GENERAL EVALUATION OF HARD TiN AND TiVN COATINGS PRODUCED BY DC-MAGNETRON SPUTTERING,

Arturo Talledo¹, Robinson Figueroa¹, Carsten Benndorf², Urban Wiklund³, Mats Larsson³ and Sture Hogmark³, ¹Facultad de Ciencias, Universidad Nacional de Ingeniería, Apartado 31.139, Lima, Peru, ²Dept. of Physical Chemistry, Hamburg University, Bundesstrass 45, D 201 46 Hamburg, Germany, ³Division of Materials Science, Dept. of Technology, Uppsala University, Box 534, S-751 21, Uppsala, Sweden.

High hardness titanium nitride, as well as, titanium-vanadium nitride have been produced by dc-magnetron sputtering on high speed steel, stainless steel and (100)-silicon substrates. Chemical and structural characterization were carried out by XPS and XRD respectively. Rockwell C indentation was used to verify the high adherence tothe substrate. Vickers microhardness was carried out and indentations were observed by Scanning Electron Microscopy. Nanoindentation measurements were also achieved.