I. Oidor-Juárez, C. Zúñiga-Romero, F. Rodríguez-Melgarejo, R. Castanedo-Pérez, G. Torres-Delgado, O. Jiménez-Sandoval, M.A. Hernández-Landaverde, and S. Jiménez-Sandoval. Laboratorio de Investigación en Materiales, Centro de Investigación y de Estudios Avanzados del I.P.N., Unidad Querétaro, Apartado Postal 1-798, Querétaro, 76001 Qro, México.

We present in this work our results on the growth and study of FeS thin films deposited by rf sputtering. The samples were grown on Corning glass substrates at 25, 120 and 180 ºC. The lattice characteristics were determined by X-ray diffraction at room temperature. The surface morphology was analyzed in an atomic force microscope and lattice vibrational modes measured by micro-Raman spectroscopy. These results have been correlated with the average chemical composition of the films and with the substrate temperature. In some cases we obtained sulfur-rich films since the sputtering yield of sulfur is substantially higher than that of Fe. Finally, we present some preliminary results on the optical absorption properties of the FeS films in the UV-VIS range.