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X-ray reflectivity study of a W/Si multilayer grating

M. Jergel1a , D, P.Mikulik2r , Y, L. Ortega3, E. Majkova4, E. Pincik4, S. Luby4, I. Kostic5, P. Hudek5
1Centro de Investigacion y de Estudios Avanzados del IPN, Mexico City, Mexico
2Fraunhofer Institut fuer Zerstoerungsfreie Pruefverfahren, Dresden, Germany
3Laboratoire de Cristallographie du CNRS, Grenoble, France
4Institute of Physics, Slovak Academy of Sciences, Bratislava, Slovakia
5Institute of Computer Systems, Slovak Academy of Sciences, Bratislava, Slovakia

Multilayer gratings are thin film structures with unique optical and electronic properties utilized in X-UV optics (mirrors) and microelectronics (quantum wires), respectively. The structural characterization is of primary importance to control the dominant properties of interest. The x-rays provide the only non-destructive tool giving access to the surface morphology and internal structure of the grating at the same time. We have studied an optical lamellar W/Si multilayer grating with nominal lateral and normal periods of 800 nm and 8 nm, respectively, prepared by electron beam evaporation and electron beam lithography. Coplanar and non-coplanar X-ray reflectivities have been measured with laboratory and synchrotron sources, respectively. The vertical layer set-up and the interface roughnesses are determined from the fit of coplanar measurements with the calculation performed within the dynamical theory of X-ray scattering. Non-coplanar measurements are discussed qualitatively using constructions in the reciprocal space. Slight imperfections of the real grating structure due to the preparation procedure have been revealed and are discussed.

a: on  leave from Institute of Physics, Slovak Academy of Sciences, Bratislava, Slovakia
r: on  leave from Laboratory of Thin Films and Nanostructures, Masaryk University, Brno, Czech Republic


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